Product News | Aug 24, 2015
Veeco, a leader in Gas Mixing technology, has introduced the Apex™ Gas Mixing System designed to address this manufacturing need and catalyze effective, low-cost point-of-use gas mixing.
The Apex system generates precise binary gas mixtures on a single platform for use in semiconductor applications at 20nm and below. Apex improves concentration control versus existing methods, providing tighter process management, increased tool uptime and reduced manufacturing costs. It is optimized for advanced silicon epitaxy applications and other processes requiring low concentration and high precision for cost-sensitive gas mixtures. Apex provides a reliable flux of the binary gas at a highly precise concentration level.